Sputtering System

Description

The UHV Vacuum D-shaped Sputtering chamber is made out of SS 304 stainless-steel material with provision of water-cooling facility. Chamber of sizes 500 mm (W) X 500 mm (D) X 500mm (H) with front opening door which is accessible to inside the chamber through the door and easy loading of samples. The vacuum chamber will be made of electro-polished SS 304 material along with optical view port for plasma viewing with shutter arrangement to avoid material deposition on the view port. The equipment will be able to achieve vacuum better than 5×10-7 mbar in reasonable time of pumping time from atmosphere. The instrument will be able to achieve ultimate vacuum ~5×10-7 mbar in a clean and dry atmosphere. The equipment will have ‘sputter up’ configuration and accordingly the sputter sources and substrate holders will be designed. The chamber has number of ports for connecting turbo pump, dry scroll pump, vacuum gauges, magnetron, MFC and other blanked ports as a provision.